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Low loss high dielectric permittivity of polyvinylidene fluoride and KxTiyNi1−x−yO (x=0.05, y=0.02) composites
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Citations
26
References
2010
Year
Materials ScienceElectrical EngineeringDielectricsPolyvinylidene FluoridePure PvdfFlexible ElectronicsHomogeneous Thick FilmEngineeringApplied PhysicsMicrowave CeramicThin Film Process TechnologyThin FilmsPercolation TheoryFunctional MaterialsElectrical PropertyElectrical Insulation
Homogeneous thick film (∼0.10 mm) of high dielectric K0.05Ti0.02Ni0.93O; abbreviated as KTNO/polyvinylidene fluoride (PVDF) composite has been prepared by hot-molding technique. The frequency and temperature dependent dielectric behavior of this composite has been studied by varying the KTNO volume fraction (fKTNO). Near the percolation threshold (fKTNO=0.40), a large enhancement of effective dielectric permittivity (εeff∼400 which is 40 times higher than that of pure PVDF) with low loss (∼0.20 at 1 kHz) is observed. The experimental εeff data have been fitted with different theoretical models and found to follow percolation theory successfully. Such a high εeff and low loss flexible dielectric material appears to be suitable for technological applications.
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