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Photoconductance of aligned SnO2 nanowire field effect transistors
48
Citations
22
References
2009
Year
SemiconductorsElectrical EngineeringElectronic DevicesEngineeringHigh SensitivityField Effect TransistorsNanotechnologyNanoelectronicsOptoelectronic MaterialsApplied PhysicsOxide ElectronicsPhotoelectric MeasurementOptoelectronic DevicesOptoelectronicsNanophotonicsAligned Sno2 NanowireSemiconductor Nanostructures
We report on the optoelectronic properties of the aligned SnO2 nanowire (NW) field effect transistors (FETs) fabricated via a sliding transfer of NWs grown by chemical vapor deposition. Photocurrent measurements with polarized UV light confirmed a well aligned NWs along the channels. UV photosensitivity of ∼107 at the gate voltage Vg=−40 V was obtained due to a small dark-current at the turn-off state of FET. The dynamic response of the photocurrent became faster for the higher mobility SnO2 NW FETs. We expect our aligned SnO2 NW FETs will be useful as polarized UV detectors with a high sensitivity.
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