Publication | Closed Access
100 V class multiple stepped oxide field plate trench MOSFET (MSO-FP-MOSFET) aimed to ultimate structure realization
49
Citations
13
References
2015
Year
Unknown Venue
Electrical EngineeringSemiconductor DeviceEngineeringHigh Voltage EngineeringBias Temperature InstabilityOxide SemiconductorsTeg SamplesField PlatePower Semiconductor DeviceGradient Oxide StructurePower ElectronicsV Class MultipleMicroelectronicsStructure RealizationExtreme Environment ElectronicsPower Electronic Devices
For low-voltage power MOSFETs technology, Field Plate (FP) and Superjunction (SJ) structures have been applied to reduce on-resistance drastically. As one of the approach for the ultimate structure realization, we propose a multiple stepped oxide FP-MOSFET (MSO-FP-MOSFET) that is extremely close to ideal gradient oxide structure. We have validated an optimum device structure by TCAD simulation and achieved lowest on-resistance of 28.5 mΩmm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> at breakdown voltage of 115.2 V. This performance indicates 25 % improvement compared to conventional devices. Moreover, to demonstrate the MSO-FP-MOSFET characteristics for the first time, we present some measurement data of TEG samples.
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