Preparation and Characterization of Thin Film Li[sub 4]Ti[sub 5]O[sub 12] Electrodes by Magnetron Sputtering

Abstract

This paper reports that spinel-phase thin films were successfully grown by radio frequency (rf) magnetron sputtering on an substrate. In this process, the buffer layer of gold serves as a template for the texture growth of film. The growth temperature affects the microstructure and electrochemical characteristics of the deposited films. In our study, the spinel phase of appears at deposition temperatures above . The redox peaks in the cyclic voltammetry of the cell approach the typical value of as raising the deposition temperature. Moreover, the influences of the surface morphology of the film on the capacity were studied. They show that a columnar structure with high porosity was obtained in the film deposited above . The columnar grains with good crystallinity of the deposited enhance the capacity of the electrode. In this work, the capacity of can be attained for the film with a thickness of deposited at . This study sheds light on the realization of a solid-state thin film battery and provides a possible solution of electrical power for a mobile integrated circuit chip.