Publication | Open Access
Direct Electrodeposition of Highly Dense 50 nm Bi<sub>2</sub>Te<sub>3-</sub><i><sub>y</sub></i>Se<i><sub>y</sub></i> Nanowire Arrays
146
Citations
11
References
2003
Year
EngineeringElectrode-electrolyte InterfaceChemistrySemiconductor NanostructuresNm Diameter WiresNanoscale ScienceElectrode Reaction MechanismMaterials ScienceOxide HeterostructuresNanoscale SystemNanotechnologyOxide ElectronicsSurface ElectrochemistryElectrochemical ProcessDirect ElectrodepositionElectrochemistryElectronic MaterialsX-ray DiffractionApplied PhysicsNm Bi2te3-ysey WiresFunctional MaterialsElectrochemical Surface Science
Films and arrays of 200 and 50 nm diameter wires of Bi2Te3-xSex have been electrodeposited in the following general reaction: 2Bi3+ + (3−y)HTeO2+ + (y)H2SeO3 + (9+y)H+ + 18e- → Bi2Te3-ySey + (6+y)H2O. Films produced from an electrolyte of 0.0075 M Bi, 0.0090 M Te, and 0.0010 M Se in 1 M HNO3 at a potential of ∼0 V vs Ag/AgCl are single phase with composition Bi2Te2.6Se0.4 as determined by X-ray diffraction, energy-dispersive X-ray spectroscopy, and scanning electron microscopy. Similar conditions yield arrays of 200 and 50 nm Bi2Te3-ySey wires when deposited into porous alumina templates. The wires are single phase, crystalline, and textured, with up to 85% pore filling.
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