Influence of annealing on spin-dependent tunneling characteristics of fully epitaxial Co2MnGe/MgO/Co50Fe50 magnetic tunnel junctions

Tomoyuki Taira, Takayuki Ishikawa, Naoki Itabashi, Ken-ichi Matsuda, Tetsuya Uemura, Masafumi Yamamoto

Applied Physics Letters · 2009 · 16 citations · 14 references

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Abstract

We found that the tunnel magnetoresistance ratio of fully epitaxial Co2MnGe/MgO/Co50Fe50 magnetic tunnel junctions (MTJs) increased discontinuously and significantly from 92% at room temperature (RT) (244% at 4.2 K) for Ta of 475 °C to 160% at RT (376% at 4.2 K) for Ta of 500 °C, where Ta is the temperature at which the MTJ trilayer was in situ annealed right after deposition of the upper electrode. We also found that the dI/dV versus V characteristics for the parallel and antiparallel magnetization configurations changed discontinuously and markedly with increasing Ta from 475 °C or less to 500 °C or higher. These significant changes are discussed in terms of a possible change in the spin-dependent interfacial density of states.

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