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Influence of acetylene precursor diluted with argon on the microstructure and the mechanical and tribological properties of a-C:H films deposited via the modified pulsed-DC PECVD method

Materials ScienceMaterials EngineeringEngineeringSurface ScienceApplied PhysicsTribological PropertiesAcetylene PrecursorH FilmsChemical Vapor Deposition