Growth of tio(x) films magnetron sputtering by high power pulsed from a compound tio(1.8) target

Abstract

High power pulsed magnetron sputtering (HPPMS) has been employed for the growth of TiO(x) (x greater than 1.8) films from a ceramic TiO(1.8) target in an Ar-O(2) ambient. The film properties have b ...