Publication | Closed Access
RF plasma enhanced MOCVD of yttria stabilized zirconia thin films using octanedionate precursors and their characterization
13
Citations
34
References
2015
Year
Materials ScienceEngineeringOxide ElectronicsApplied PhysicsOctanedionate PrecursorsRf PlasmaThin Film Process TechnologyThin FilmsZirconia Thin FilmsChemical Vapor DepositionThin Film Processing
| Year | Citations | |
|---|---|---|
Page 1
Page 1